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DC power supply vacuum magnetron sputtering system for glass silicon wafer
Get Latest Price
US$ 24300
≥1 Sets
Quick Details
Machine Type:
Laboratory Coating Machine, Coating Equipment
Marketing Type:
Hot Product 2024
Place of Origin:
Henan, China
Brand Name:
CY
Product Details
DC power supply vacuum magnetron sputtering system for glass silicon wafer
Product Description
MAGNETRON SPUTTERING: OVERVIEW
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing film.
Features of magnetron sputtering coater:
1. Triple target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable.
2. There are 1-inch, 2-inch and 3-inch magnetron targets. You can choose the target according to the size of the substrate to be coated.
3. The magnetron sputtering coater is equipped with 500W DC power and 500W RF power. The DC power is used for the conductrive materials, and the RF power is used for the
insulating materials
. Power from
300W to 1000W
in according to your requirements.
4. The magnetron sputtering coater is equipped with two-channel high-precision mass flowmeter. Four-channel mass flowmeters is available
5. The magnetron sputtering coater is equipped with turbo-molecular pump, and the ultimate vacuum is up to 10E
-4
Pa, other types of molecular pumps are available for purchase.
6. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump.
7. This product can be equipped with an integrated industrial computer to control the system.
Technical Parameters
Specifications of magnetron sputtering coater:
|
Single Target Magnetron Sputtering Coater |
||||
|
Sample stage
|
S ize |
φ100mm |
Heating |
Max. 500ºC |
|
Rotating speed |
0-20 adjustable |
|||
|
Sputter Gun |
Quantity |
2 inch*1 |
||
|
Vacuum chamber |
Chamber size |
Φ245mm x 300mm |
Observation window |
Front φ60mm |
|
Chamber material |
SS304 |
Opening method |
Top cover open |
|
|
Vacuum system |
Backup pump |
Rotary vane pump |
Pumping interface |
KF16 |
|
Molecular pump |
Turbomolecular pump |
Pumping interface |
KF40 |
|
|
Vacuum measurement |
Resistance gauge + ionization gauge |
Exhaust interface |
KF16 |
|
|
Ultimate vacuum |
1.0E-4Pa |
Power supply |
AC 220V 50/60Hz |
|
|
Pumping rate |
Mechanical pump: 1.1L/s Molecular pump: 60L/S |
|||
|
Power configuration |
Quantity |
DC power supply x1 |
Maximum output power |
DC power supply 300W |
|
Other |
Supply voltage |
AC220V, 50Hz |
Dimensions |
550 * 350 * 400mm |
|
Total power |
2kW |
|||
Product Pictures
1. W
e
have magnetron sputtering coater with 1 target, 2 targets, 3 targets, 4 targets, etc. The target can be designed at the top or bottom of the chamber.
2. 0-1000W DC power or RF power target is available. Bias function is optional
3. Target size: 1-inch, 2-inch, 3-inch, 4-inch, etc.
4. Strong magnetic target and Pernanent magenetic target is optional
5. Magnetron sputtering coater with evaporation,
E
-beam is available
6. Customized service is always available!
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