Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

MF Sputtering

DC magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as kinds of plastic, glass, metal, ceramic, etc.

We have dedicated more than 10 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.

Magnetic fields can essentially define the behaviour and the properties of the ion charged particles that are used for sputtering. The development and commercialisation of software that can enable the distinct modelling of magnetron sputtering is bound to enhance its productivity, applicability, and reproducibility.

T echnical Spcifications

Model Number	SP-1000	SP-1200	SP-1400	SP-1800
Dimension of vacuum chamber	1000*1100	1200*1400	1400*1600	1800*2000
(diameter*height)
Material of vacuum chamber	Carbon steel, SUS304 or SUS316L
Quantity of sputtering cathodes	≥1 sets, DC sputtering system, cylindrical or rectangle sputtering cathodes
Pumping system	Turbo molecular pumps or diffusion pump+mechanical pump
Pumping Time	From atmosphere to 5.0*10-2Pa  less than 8 minutes
Gas distribution System with Mass Flow Controllers	≥2 sets
Ultimate Vacuum	5.0*10-4 Pa
Working temperature	Room temperature
Working mode	Automatic or Manual mode, by 10.4(or 15) inches PLC touches screen
Total Power	40-100kW			70-1000kW
These units you can custom made	1. Size of vacuum chamber
	2. Quantity of sputtering cathodes
	3. Configurations of pumps
	4. Gas distribution system
Optional instruments	1. Coatings thickness monitor
	2. Leakage detector
	3. Arc ion deposition system(not for continuous model)
	4. Evaporation system(not for continuous model)

PS: All the specifications can be customized according to your requests.

You will need some necessary parts for daily production, we can also provide:

·     Vacuum pumps

·     DC sputtering cathode with power supplies

·     Unbalanced sputtering cathode with power supplies

·     O rings

·     Vacuum meter with gauges/sensors

·     Bias power supply

·     Magnetic valves

·     MFC

·     Target materials

·     Customized jigs